http://www.ao.u?tokai.ac.jp/photopolymer/p.htm
Call for Papers
ICPST-29
The 29th International Conference
of
Photopolymer Science
and
Technology
Materials & Processes
for
Advanced Microlithography,
Nanotechnology and Phototechnology
June 26 - 29, 2012
University Convention Hall
Chiba University, Chiba, JAPAN
Sponsored by CPST
Co-sponsored by
The Technical Association of
Photopolymers, Japan
In Cooperation with
Chiba University
Japan Society of Applied Physics
Chemical Society of Japan
Introduction
The 29th International Conference of Photopolymer Science and Technology,
Materials & Processes for Advanced Micro-Lithography, Nanotechnology and
Phototechnology (ICPST-29) organized by CPST will be held at University
Convention Hall, Chiba University, Chiba, Japan on June 26 - 29, 2012.
All the contributorsof papers on the scientific progress and the technical
develop-ment of photopolymers are cordially invited.
Scopes
The conference covers a wide range of topics relevant to photopolymer science
and technology in the following fields:
A. English Symposia
A1. Next Generation Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Advanced Materials for Molecular Device and
Technology
A4. 193 nm Lithography and Immersion Lithography/ Double
Patterning
A5. EB Lithography
A6. Nanoimprint Lithography
A7. EUV Lithography
A8. Chemistry for Advanced Photopolymer Science
A9. Photofunctional Materials for Electronic Devices
A10.General Scopes of Photopolymer Science and Technology
P. Panel Symposium "Nanobiotechnology"
B. Japanese Symposia
B1. Polyimides and High temperature Polymers
-Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of
Polymer Surfaces
B3. Photofunctional Materials for Electronic Devices
B4. General Scopes of Photopolymer Science and Technology
Language & Presentation
English is used for presentations in the English Symposia.Japanese and
English are used for presentations in the Japa- nese Symposia. Each presentation
will not be longer than 20 minutes including discussion.
Application
Download for Application Form
Authors must send the attached application form to the Edito-rial Office before
February 14, 2012.
Editorial Office:
Prof. Kenichiro Nakamura
Journal of Photopolymer Science and Technology,
Department of Optical and Imaging Science & Technology, Tokai University
Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
Phone +81-463-50-2156 Fax +81-463-50-2408
E-mail nakamura@keyaki.cc.u-tokai.ac.jp
Papers
Papers submitted to ICPST-29 are published in Journal of Photopolymer Science and
Technology, Vol. 25 (2012) after reviewing on the Journal's standard. Journal will
be distributed to each participant during the conference. Preparation of manuscripts
for the Journal should be followed to "Instructions to Authors" and "Manual for
Manuscript Writing" which will be mailed to the applicants. The manuscripts should
arrive at the Editorial Office before April 1, 2012.
Registration for Overseas Participants
All the overseas participants are requested to send their registration form filled
with their names, affiliations and addresses to the Conference Office of ICPST-29
before May 31, 2012.
Conference Office
The 29th International Conference of Photopolymer Science and Technology(ICPST-29)
c/o Prof. M. Kuzuya,
Faculty of Pharmaceutical Sciences, Matsuyama University
4-2 Bunkyocho, Matsuyama, Ehime 790-8578, Japan
Phone +81-89-926-7096 Fax +81-89-926-7162
e-mail mkuzuya@cc.matsuyama-u.ac.jp
Registration Fee for Overseas Participants
Registration fee of whole conference is \25,000 for speakers and \35,000 for the others.
The registration fee will be reduced for speakers who must pay it at private expense.
Please contact the Conference Office.
Banquet
Banquet will be open at 18:00 p.m. on June 28, 2012.
Cancellation
Refunding for cancellation will be made after the Conference under the following conditions:
Cancellation until May 31, 2012 80%
Cancellation after June 1, 2012 No refund
The Conference of Photopolymer Science and
Technology (CPST)
Conference Chairperson: Minoru Tsuda
Chairperson of Publication: Kenichiro Nakamura
Chairperson of Administration: Masayuki Kuzuya
ICPST-29 International Advisory Board
James Thackeray (USA), Hyun-Woo Kim (Korea)
Xavier Allonas (France).
ICPST-29 Organizing Committee
Minoru Tsuda*, Chairperson
Members: M. Endo*, E. Hasegawa*, Y. Hirai*,
T. Hirayama*, T. Ichiki*, M. Kakimoto*, T. Karatsu*
M. Kato, Y. Kawai*, Y. Kawaguchi*, N. Kihara*,
M. Kuzuya*, J. Mizuno*, Y. Nagsaki,*, T. Nagai*,
K. Nakamura*, S. Nonogaki, K. Nozaki*, Y. Oonishi*,
S. Seki*, M. Shirai*, H. Suzuki*, M. Tomikawa*,
M. Ueda*, T. Ueno*, T. Yamaoka, T. Yamashita*,
T. Watanabe*
*ICPST-29 Program Committee Members
ICPST-29 Prgram Committee Masayuki Endo, Chairperson
Local Committee: Takashi Karatsu, Chairperson
ICPST-29
□Author's Application Form
□Registration Form for overseas participants
Please complete (type or print)
Title of Paper :
All the Authors' Names:
Category (Code in the Scopes) :
Correspondence
Name:
Affiliation and Address:
Postal Code:
Tel : Fax :
E-mail :
Author must send this form to the Editorial Office (Fax +81-463-50-2408),
E-mail: nakamura@keyaki.cc.u-tokai.ac.jp) not later than February 14, 2012.
All the overseas participants are requested to send this Registration Form to
the ConferenceOffice (Fax +81-89-926-7096), E-mail: mkuzuya@cc.matsuyama-u.ac.jp,
before May 31, 2012.