Contents of Journal of Photopolymer Science and Technology Volumer 15, No. 1-5 (2002)
The Photopolymer Science and Technology Award 3
Masamitsu Shirai, Toyofumi Shinozuka, Haruyuki
Okamura, Masahiro Tsunooka,
Shinji Kishimura, Masayuki Endo and Masaru Sasago
The Photopolymer Science and Technology Award 7
Hiroshi Ito, Gregory M. Wallraff, Nicolette Fender,
Phillip J. Brock, Carl E. Larson,
Hoa D. Truong, Gregory Breyta, Dolores C. Miller,
Mark H. Sherwood and
Robert D. Allen
The Photopolymer Science and Technology Award 11
Kohei Goto, Yasutake Inoue and Minoru Matsubara
Design of Organic-Inorganic Hybrid Waveguide 13
Hiroyo Segawa, Koichi Omura, Yasuhiko Arai and
Kazuaki Yoshida
Acryl Polymer-Silica Hybrid for Electron Beam Resist 19
Toshiyuki Tamai, Kimihiro Matsukawa, Yukihito
Matsuura, Hiroshi Inoue,
Hiroshi Toyota, Kazuo Satoh and Hiroki Fukuda
Two-Photon Sensitized Polymerization of Vinyl Ethers via Electron
Transfer of ZnTTBP 23
Satoshi Ohkuma and Takashi Yamashita
Novel Diaryliodonium Salts for Cationic Photopolymerization 29
Akihiro Shirai, Hideo Kubo and Eiji Takahashi
Structural Effects of Nitro-substituted Amineimide Derivatives on
the Photobase 35
Generation in an Epoxide/thiol Curing System
Shigeki Katogi and Masami Yusa
UV-Curable Organic-Inorganic Hybrids Containing a Base Amplifier 41
Koji Arimitsu, Masayuki Hashimoto, Takahiro Gunji,
Yoshimoto Abe
and Kunihiro Ichimura
Visible Light Crosslinking of Polymeric Photobase Generators
Using Ketobiscoumarins 43
Kanji Suyama, Tadahiro Ohba, Masamitsu Shirai and
Masahiro Tsunooka
Photocuring Systems Using Quaternary Ammonium Thiocyanates 47
Masahiro Tsunooka, Takayuki Yamamoto, Yusuke
Kurokawa, Kanji Suyamand Masamitsu Shirai
Development of Photoinitiators in Electronic Applications 51
M. Ohwa, H. Kura, H. Oka and H. Yamato
Characterization of Photochemical Reaction in Photosensitive
Printing Plates 59
Keizo Kawahara, Takatoshi Yamada, Yasuyuki Okazaki,
Satoshi Imahashi and Yoshimitsu Sakaguchi
Adhesive Property Changes of Fluorocarbon Polymer Photo-Induced
by Surface 65
Chemical Modification
Hiroyuki Niino, Atsushi Miyabo, Hiromi Yanase and
Akira Yabe
Preparation of Polyperinaphthalene Thin Films by Excimer Laser
Ablation and Their Application to Optic and Electronic Devices 71
Satoru Nishio, Hiroyasu Sato, Nobuo Ando and
Yukinori Hato
Chemical Reactivity of Trimethylsilyl Azide in Gas Phase
Synthesis of Ultrafine 77
Particles from Acrolein
Hiroshi Morita, Kazuya Imura and Tetsuya Sano
Two-photon Microstructure-polymerization Initiated by a Coumarin
Derivative, 83
Titanocene and N-phenylglycine System
Yang Yongyuan, Feng Shujing, Li Chengde, Lao Le,
Wang Shufeng, Hang Wentao and Gong Qihuang
Synthesis and Imaging Performances of a New Type PAC 89
Wang Xuefei, Liu Zhengping, Gu Jiangnan and Yu
Shangxian
Photoreaction Mechanism fo Benzilmonooxime Methacrylate Polymer
and its Model Compounds 97
Ikuo Naito, Yoshihiro Fujimura, Shinjiro Kobayashi
and Masashi Kotani
Photolithographic Properties of Photosensitive Sol-gel Materials
and Their Application to Optical Waveguides 103
Kentarou Tamaki, Tomohiro Utaka, Hideaki Takase,
Yuichi Eriyama and Takashi Ukachi
DNA Microarray Fabrication by Photo-Sensitive Polyvinyl Alcohol 109
Gen Nakauchi, Yasusi Ohtani, Yoshiaki Inaki and
Mikiji Miyata
The Calculation of Electronic Spectra of Protonated
Benzodixanthene Analogs 111
Tatsuya Tachikawa and Sumio Tokita
Quantitative Estimation of Free Volume Distribution of Polymers
with Photochromic Reactions 115
Mitsue Sato and Takashi Yamashita
Adhesion and Cohesion Properties of Dot Resist Patterns Ranging
from 84 to 364 nmDiameter Analyzed by Direct Peeling Method with
Atomic Force Microscope Tip 121
Akira Kawai
Van der Waals Interaction between Polymer Aggregates and
Substrate Surface Analyzed by Atomic Force Microscope (AFM) 129
Akira Kawai and Daisuke Inoue
Synthesis and Polymerization of Aminoquinoxaline Derivatives and
Their Optical Characteristics 133
Hitoshi Furusho, Akira Yanagimoto, Hisae Miyamoto,
Katumi Chikama and Yukio Nagasaki
A New Formation Method of a Polymer Thin Film with Organic Dyes
Using Vacuum Technique 137
Toshiko Mizokuro, Hiroyuki Mochizuki, Noritaka
Yamamoto, Norio Tanaka,Shin Horiuchi and Takashi Hiraga
Positive-Working DUV Resist Based on Terpene Derivatives as
Cross-linker 141
ChulHo Park, JongSoo Lee, Nobukazu Miyagawa, Shigeru
Takahara,Tsuguo Yamaoka, Katsuhiko Kanesige, Katsuaki Saeki
and Toshiyuki Morikawa
I-Line Sensitive Photoacid and Photobase Generators and Their Use
for Photocrosslinking System Based on Poly(vinylphenol) and Diepoxy
Fluorene Derivatives 145
Haruyuki Okamura, Yurika Watanabe, Masahiro
Tsunooka, Masamitsu Shirai,
Tsuyoshi Fujiki, Shinichi Kawasaki and Mitsuaki
Yamada
Reactivities and Thermal Mechanical Properties of Poly(vinyl
alcohol) and Poly(vinyl-b-acrylic acid) with Pendant Styrylpyridinium
Groups 153
Yoichi Shindo, Yusuke Yamada, Junichi Kawanobe and
Kazuo Inoue
Development of Photosensitive Porous-polyimide with Low
Dielectric Constant 159
Amane Mochizuki, Takahiro Fukuoka, Mitsuhiro Kanada,
Naotaka Kinjou and
Takayuki Yamamoto
A Novel Low Wafer Stress i-Line Definable Polyimide 167
Akihiro Sasaki, Masahiro Miyasaka, Masahiko Hiro and
Makoto Kaji
Application for WLP at Positive Working Photosensitive
Polybenzoxazole 173
Kagehisa Yamamoto and Takashi Hirano
Overview of Photo-definable Benzocyclobutene Polymer 177
Kaoru Ohba
Orgainc Solid-Sate Laser 183
Yoshio Taniguchi
Synthesis and Photocrosslinking Reaction of Hyperbranched
Polyimide with Methacryloyl Groups 185
Shohei Makita, Hiroto Kudo and Tadatomi Nishikudo
Photosensitive Polyetherimide (Ultem) Based on Reaction
Development Patterning (RDP) 191
Takafumi Fukushima, Yukiko Kawakami, Toshiyuki Oyama
and Masao Tomoi
New Positive-type Chemically Amplified Photosensitive
Poly(phenylene ether):5
Synthesis of Poly(2-hydroxy-6-methylphenylene ether) by Oxidative
Coupling Polymerization of 2-Trialkylsilyloxy-6-Methylphenol 197
Yuji Shibasaki, Yasuyuki Sasada and Mitsuru Ueda
A Novel Positive Working Photosensitive Polyimide for Wafer-level
CSP Packages 201
Tomoyuki Yuba, Mitsuhito Suwa, Yoji Fujita, Masao
Tomikawa and Gentaro Ohbayashi
Low-Temperature-Curing Type Positive-Tone Photosensitive Polyimide
Coatings for Insulating Layer in OLED Displays 205
Ryoji Okuda, Kazuto Miyoshi, Nana Arai, Masao
Tomikawa and Gentaro Ohbayashi
Photochemical Interaction of Diimide Compounds with Fullerene C60
Yasuo Shigemitsu, Yusuke Tajima, Mikio Hoshimo, 209
Yoshihiko Tezuka and
Kazuo Takeuchi
Synthesis of Alicyclic Polyimides from Fluorinated Alicyclic
Diamine 213
Yoshiyuki Oishi, Norie Kikuchi, Kunio Mori, Shinji
Ando and Kazuhiko Maeda
Synthesis and Properties of Structurally Ordered Alicyclic
Polyimides 215
Kazuaki Kudo, Jun Li, Daigo Nonokawa, Takuya
Yoshizawa, Yosuke Kishida,
Toshio Takayama and Shinsaku Shiraishi
Synthesis and Characterization of Hyperbranched Polybenzoxazoles 219
Chi-sun Hong, Mitsutoshi Jikei and Masa-aki Kakimoto
Thermally Stable Polyarylenes with Low Dielectric Constant:
Direction towards the Lowest Limit of Dielectrics 223
Kohei Goto, Toshiyuki Akiike, Keiji Konno, Tadahiro
Shiba, Matthias Patz,Masayuki Takahashi, Yasutake Inoue and Minoru
Matsubara
Synthesis, Characterization, and Optical Properties of Uniaxially
Drawn and Gold Nanoparticle Dispersed Fluorinated Polyimide Films 231
Satoshi Koizumi, Sho-ichi Matsuda and Shinji Ando
Investigation of Blue Dopant Used Coumarin Derivatives 237
Makoto Fujiwara, Matsuko Ishida, Makoto Satsuki and
Sadaharu Suga
Development of New Hole-transporting Amorphous Molecular
Materials withHigh Glass-transition Temperatures and Their Application
in ThermallyStable Organic Electroluminescent Devices 239
Kenji Okumoto, Hidekaru Doi and Yasuhiko Shirota
Effects of Passivation and Desiccant on Organic Light-Emitting
Diodes 243
Tatsuo Mori, Yuichi Okada, Kouji Tamano and
Teruyoshi Mizutani
Color Passive-matrix Organic Electroluminescent Displays 247
Yoshikazu Sakaguchi, Hiroshi Tada, Kenji Mori,
Yuichi Iketsu and Joji Suzuki
Multi-layer Polymer Light-emitting Diodes with
2,3-Dialkoxy-p-phenyleneVinylene and its Blends 253
Takeshi Sano, Chi-Shen Tuan, Rainer E. Martin and
Andrew B. Holmes
Electroluminescent Properties of a Triphenylamine-Containing
Poly(phenylenevinylene) 259
Yong-Jin Pu, Minoru Soma, Junji Kido and Hiroyuki
Nishide
Organic EL Devices Having Lewis-Acid-Doped Polymer As a 261
Hole-Injecting Layer
Kinh Luan, Thanh Dao and Junji Kido
Three-Dimensional Orientation of Mesogenic Moieties in
Photo-Cross-Linkable Copolymer Liquid Crystals by Irradiation
with Polarized Light 265
Nobuhiro Kawatsuki, Nobuyoshi Furuso, Kohei Goto and
Tohei Yamamoto
High Speed Operation of Organic Electroluminescent Diodes:
Application for Polymeric Optical Integrated Circuits 271
Yutaka Ohmori, Hirotake kajii, Takayuki Taneda,
Takahisa Tsukagawa and Masamitsu Kaneko
Organic Polymer DBR Laser by Softlithography 273
Naotoshi Suganuma, Akiko Seki, Yuji Tanaka, Musubu
Ichikawa, Toshiki Koyama and Yoshio Taniguchi
Electrochemical Characteristics of Platinum Surface Protected by
Plasma Polymerization Membrane (1) Nernstian Response to Proton 279
Tatsuhiko Yajima, Namie Harada, Takanari Honjo,
Kazuo Sugiyama and Shunichi Uchiyama
Simple Monitoring of Discharge State in Inductively Coupled Plasma
Using Radio Frequency Impedance Analyzer 283
Kikuko Yoshimura, Shinji Nakagami, Takeshi
Minaguchi, Hirohiko Nakano,
Toshiaki Tatsuta and Osamu Tsuji
Is There Any Possibility That Plasma Could Selectively Modify
Polymer Surfaces? 291
N. Inagaki
Photocatalytic Property of Metal Oxide Powders Treated by CH4-H2
Plasma CVD Method 297
Kazuo Sugiyama, Takayuki Ogawa, Shuuichi Murata and
Tatsuhiko Yajima
Plamsma Treatment of Silk Fabrics for Better Dyeability 299
Yu Iriyama, Takeo Mochizuki, Makoto Watanabe and
Makoto Utada
Behavior and Effect of Plasma After Passing Through the Slit 307
Masaaki Katoh, Masaki Shibata, Akira Kojima and
Takeo Ohte
Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass
Chips Using Deep Dry Etching and Anodic Bonding 311
Takanori Ichiki, Yoshinari Sugiyama and Yasuhiro
Horiike
Refractive Index and Transmittance Optimization of C-S-Au Film
by Plasma Process 317
Md. Abul Kashem, Masaki Matushita and Shinzo Morita
Adsorption of anti-C-Reactive Protein Monoclonal Antibody and Its
F(ab,)2 fragment on Plasma-Polymerized Styrene, Allylamine and
Acrylic Acid Coated with Quartz Crystal Microbalance 328
Shigeru Kurosawa, Tomoya Hirokawa, Kazuya Kashima,
Hidenobu Aizawa, Jong-Won Park, Mitsuhiro Tozuka,
Yasuo Yoshimi and Katsuhiko Hirano
Preparation of Floating Drug Delivery System by Plasma Techniques 331
Masayuki Kuzuya, Tomoya Nakagawa, Shin-ichi Kondo,
Yasushi Sasai and
Yoshimitsu Makita
Thermo-responsive Properties of Surface Layer of
Poly(tetrafluoroethylene) Plates Grafted with N-Isopropylacrylamide
by Oxygen Plasma-treatment and Photografting 335
Kiyomi Matsuda, Takahiro Nakamura, Kazunori Yamada
and Mitsuo Hirata
Functionalization of Biomedical Polymers by Means of Plasma
Processes:
Plasma Treated Polymers with Limited Hydrophobic Recovery and
PE-CVD of-COOH Functional Coatings 341
Pietro Favia, Eloisa Sardella, Roberto Gristina,
Antonella Milella and Riccardo d ,Agostino
Current Status of the EUV Engineering Test Stand 351
Alvin H. Leung, Daniel A. Tichenor, William C.
Replogle, John E. M. Goldsmith,
Glenn D. Kubiak, Richard H. Stulen, William P.
Ballard, Karen L. Jefferson,
Leonard E. Klebanoff, Donna J. O,Connell, John
B.Wronosky. John S.Taylor,
James A. Folta, Layton C. Hale. Henry N. Chapman,
Donald W. Sweeney,
Sang H. Lee, David T. Attwood, Kenneth A. Goldberg
and Patrick Naulleau
Characteristics of CA Resist in EUV Lithography 361
Kazuhiro Hamamoto, Takeo Watanabe, Hideo Hada,
Hiroshi Komano and
Hiroo Kinoshita
A Surface-Silylated Single-Layer Resist Using Chemical
Amplification for Deep-UV and Vacuum-UV Lithography 367
Kazuyuki Sugita, Masahiro Yamashita, Kieko Harada,
Masahito Kushida andyoichi Saito
Cohesion Property of Polymer Aggregates in Resist Pattern
Analyzed by Atomic Force Microscope (AFM) 371
Akira Kawai
Below 100nm Hole Pattern Formation Using Resolution Enhancement
Lithography Assisted by Chemical Shrink (RELACSTM) 377
Toshiyuki Toyoshima, Takeo Ishibashi, Naoki Yasuda,
Shinji Tarutani,
Takashi Kanda, Kiyohisa Takahashi, Yusuke Takano and
Hatsuyuki Tanaka
Trivalent Iodine Compounds and Periodonium Salt as PAG 379
Nobukazu Miyagawa, Shigeru Takahara and Tsuguo
Yamaoka
Supercritical Drying for Nanostructure Fabrication 381
Hideo Namatsu
Line Edge Roughness and Development Rate Analysis Based on Random
Reaction/Percolation Model for Chemically Amplified Resists 389
Hiroshi Fukuda
Development Status of EPL Technology 385
Kazuaki Suzuki and Sumito Shimizu
Present Status of Exposure Tool Development for Low Energy
Electron-beamProximity Projection Lithography 403
Akihiro Endo, Akira Higuchi, Haruo Kasahara,
Hiroshi Nozue, Nobuo Shimazu,
Toyoji Fukui, Naoki Yasumitsu, Tsutomu Miyatake and
Norimichi Anazawa
Recent Advances in the Development of Chemically Amplifed Resists
for Applications in Electron Beam Lithography 411
David R. Medeiros
Ultra Thin Film Resist for Low Energy E-beam Projection
Lithography 417
Tsuyoshi Nakamura, Kiyoshi Ishikawa, Mitsuru Sato
and Hiroshi Komano
Electron Beam-Induced Reactions of a Sulfonium Salt in the Solid
State for Chemically Amplified Electron Beam Resists; Comparison with
Photolytic Reactions 423
Seong-Yun Moon, Yasunari Maekawa and Masaru Yoshida
The Frog Prince-A Brief Review of DUV Resist Technology 427
DongKwan Lee and Georg Pawlowski
Improved CD Accuracy by Electron Beam Stabilization in KrF
Lithography 435
S. Sasaki, M. Watanabe, S. Yabe and T. Taguchi
Performance of ArF Resist Process for 100nm DRAM Full Chip 441
Ki-Soo Shin, Hyeong Soo Kim and Jae Chang Jung
Photosensitive Titania Polymers 447
Douglas J. Guerrero and Tony D. Flaim
Transparency versus Efficiency: Important Considerations in the
Design of Photoacid Generators for ArF Lithography 455
James F. Cameron, Gerd Pohlers, Yasuhiro Suzuki and
Nicholas Chan
Nano-Patterning for Patterned Media using Block-Copolymer 465
Koji Asakawa, Toshiro Hiraoka, Hiroyuki Hieda,
Masatoshi Sakurai,
Yoshiyuki Kamata and Katsuyuki Naito
Two-Photon Photopolymerization of Functional Micro-Devices 471
Satoshi Kawata and Hong-Bo Sun
Application of Nano-imprint Lithography 475
Yoshihiko Hirai and Yoshio Tanaka
Step and Flash Imprint Lithography: An Efficient Nanoscale
Printing Technology 481
T. C. Bailey, S. C. Johnson, S. V. Sreenivasan, J.
G. Ekerdt,
C. G. Willson and D. J. Resnick
Microchip Technologies for the Analysis of Biological Cells 487
Takanori Ichiki, Satomi Shinbashi, Takekazu Ujiie
and Yasuhiro Horiike
Direct Electron-Beam Patterning of Surface Coatings and
Sacrificial Layers for Micro-Total Analysis Systems 493
Cindy K. Harnett, K. M. Satyalakshmi, Geoffrey W.
Coates and Harold G. Craighead
Microlens Arrays for Optoelectronic Devices 497
Francis Houlihan, Madan Kunnavakham, Alex Liddle,
Peter Mirau, Om Nalamasu and John Rogers
MPF Optical Wave-guide Fabrication 517
Chikao Yamasaki, Fujun Huang and Shinzo Morita
Etch Properties of 193nm Resists: Issues and Approaches 521
Munirathna Padmanaban, Eric Alemy, Ralph Dammel,
Woo-Kyu Kim,
Takanori Kudo, SangHo Lee, Dalil Rahman, Wan-Lin
Chen, Reza M. Sadjadi, William Livesay and Matthew Ross
Application of VEMA type ArF Resist to Sub-100nm Lithography 529
Hyun-Woo Kim, Sook Lee, Sang-Jun Choi, Sang-Gyun
Woo, Yun-Sook Chae,
Jisoo Kim, Joo-Tae Moon, Robert Kavanagh and George
Barclay
Newly Developed Acrylic Copolymers for ArF Photoresist 535
Yoshihiro Kamon, Hikaru Momose, Hideaki Kuwano,
Tadayuki Fujiwara and Masaharu Fujimoto
New ArF Photoresist Based on Modified Maleic Anhydride
Cycloolefin Polymers 541
Hyun-pyo Jeon, Dong-chul Seo, Chang-min Kim,
Young-taek Lim, Seung-duk Cho,
Jong-bum Lee, Hyun-sang Joo, Joo-hyeon Park,
Seong-Ju Kim, Jae-chang Jung,
Keun-kyu Kong, Jin-soo Kim, Ki-soo Shin and Tatsuya
Yamada
Optimization of 193nm Contact Hole Resists for 100nm Node 549
Takanori Kudo, Eric L. Alemy, Ralph R. Dammel,
Woo-Kyu Kim, Sang-Ho Lee,
Seiya Masuda, Douglas McKenzie, M. Dalil Rahman,
Andrew Romano and
Munirathna Padmanaban
DFT Calculations of Photoabsorption Spectra in the VUV Region for
Design of Photoresist Materials for 157nm Lithography 559
Shinji Ando, Tsuyohiko Fujigaya and Mitsuru Ueda
157nm Lithography - Window of Opportunity 569
Harry Sewell, James McClay, Peter Jenkins, Bruce
Tirri, Donis Flagello and
Jan Mulkens
Development of a 5 kHz Ultra-Line-Narrowed F2 Laser for Dioptric
Projection Systems 577
Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe,
Takahito Kumazaki,
Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno,
Masayuki Konishi,
Takashi Suganuma, Masaki Nakano, Toshio Yamashita,
Toshihiro Nishisaka,
Kazuaki Hotta, Hakaru Mizoguchi and Kiyoharu Nakao
The Design of Resist Materials for 157nm Lithography 583
C. Grant Willson, Brian C. Trinque, Brian P. Osborn,
Charles R. Chambers, Yu-Tsai Hsieh, Takashi Chiba,
Paul Zimmerman,
Daniel Miller and Willard Conley
Fluoropolymers for 157/193nm Lithography: Chemistry, New
Platform, Formulation Strategy, and Lithographic Evaluation 591
H. Ito, H. D. Truong, M. Okazaki, D. C. Miller, N.
Fender, P. J. Brock,
G. M. Wallraff, C. E. Larson and R. D. Allen
New Strategies for High Resolution Photoresists 603
Christopher K. Ober, Katsuji Douki, Vaishali R.
Vohra, Young-Je Kwark,
Xiang-Qian Liu, Will Conley, Daniel Miller and Paul
Zimmerman
Dissolution Inhibitors for 157nm Lithography: A Progress Report 613
Will Conley, Daniel Miller, Charles Chambers, Brian
C. Trinque, Brian Osborn,
Takashi Chiba, Paul Zimmerman, Ralph Dammel, Andrew
Romano and C. Grant Willson
Study of PAG Size Effect on Lithographic Performance of 157nm
Resists 619
Ryotaro Hanawa, Kazuhiko Hashimoto and Yasunori
Uetani
Dissolution Characteristics of Acidic Groups for 157-nm Resist 625
Shinji Kishimura, Masayuki Endo and Masaru Sasago
Methacrylonitrile Based Si-Containing Polymers for 157-nm
Positive Resist 629
Toyofumi Shinozuka, Tomoaki Kawakami, Haruyuki
Okamura, Masahiro Tsunooka and Masamitsu Shirai
Modified Acetal Approach to 157nm Resist Design 637
Sanjay Malik, Stephanie Dilocker, Jeff Eisele, Binod
De, Murrae Bowden,
Scott Scales, John Hatfield, Andrew Blakeney, Plamen
Tzviatkov and Tadayoshi Kokudo
A New Photoresist Material for 157 nm Lithography-2 643
T. Fujigaya, S. Ando, Y. Shibasaki, S. Kishimura, M.
Endo, M. Sasago and M. Ueda
Fluoroaromatic Resists for 157-nm Lithography 655
Theodore H. Fedynyshyn, Roderick R. Kunz, Roger F.
Sinta, Michael Sworin,
William A. Mowers, Russell B. Goodman and Alberto
Cabral
Investigation of Resist Characteristics of Fluoropolymer for
157nm Lithography 667
Toshiyuki Ogata, Koutaro Endo, Hiromitsu Tsuji and
Hiroshi Komano
Chemically Amplified Main Chain Scission: New Concept to Reduce
Line Edge 673
Roughness and Outgassing
Christian Eschbaumer, Nicole Heusinger, Christoph
Hohle and Michael Sebald
Fluoropolymers for 157 nm Lithography: Performance of Single
Layer Resists 677
M. K. Crawford, W. B. Farnham, A. E. Feiring, J.
Feldman, R. H. French,
K. W. Leffew, V. A. Petrov, F. L. Schadt III and F.
C. Zumsteg
F2 Laser Resist with Fluorinated Polymers 689
Takuya Naito, Satoshi Saito, Naomi Shida and Tohru
Ushirogouchi
Development of SSQ Based 157nm Photoresist[1] 693
Raymoud J. Hung, Mikio Yamachika, Takashi Chiba,
Haruo Iwasawa,
Akihiro Hayashi, Noboru Yamahara and Tsutomu
Shimokawa
Hard Mask Process Using Chemically Amplified 157-nm Resists 699
Takamitsu Furukawa, Seiro Miyoshi, Hiroyuki
Watanabe, Sigeo Irie
and Toshiro Itani
Diversion of Exposure Technology, Born from Development of
Spherical Semiconductor－ The Maskless Exposure Apparatus － 707
Akihito Ishikawa
Volume 15, Number 5, 2002
Development of Novel Photosensitive Polymer Systems Using 715
Photoacid and Photobase Generators
Masamitsu Shirai, Kanji Suyama, Haruyuki Okamura and
Masahiro Tsunooka
Efficiency of Phtoacid Generators in Chemically Amplified
Resists for 157nm Lithography 731
Adam R. Pawlowski, Paul F. Nealey and Will Conley
Coloration of Pentacosadiynoic Acid Polycrystalline Powder
Dispersed in Polymer Layer by Gamma-ray Irradiation and
UV Illumination 741
Motoyoshi Hatada, Yoshito Sakamoto and
Akisato Katanosaka
Improving the Process Capability of SU-8, Part Ⅲ 749
D. W. Johnson, D. J. Nawrocki and R. Ruhmann
Peeling Property of Resist Pattern in Water Analyzed by
Atomic Force Microscope 757
Akira Kawai and Daisuke Inoue
Resist Pattern Peel due to Resonance Effect of Micro Tip 759
Akira Kawai
Preparation of Porous Titania Thin Films from Polysilane-
Titania Hybrid by UV Irradiation 761
Yukihito Matsuura, Satoshi Miura, Hiroyoshi Naito,
Hiroshi Inoue and Kimihiro Matsukawa
Activation Energies for Deprotection Reaction of Chemically
Amplified Resists: A Study Using In-situ FT-IR Spectroscopy 765
Toyofumi Shinozuka, Masahiro Tsunooka, Toshihiro Itani and
Masamitsu Shirai
The Effect of Annealing of Organic Thin Films on Charge
Injection in Organic Electroluminescent Devices 769
Mari Ishihara, Kenji Okamoto and Yasuhiko Shirota
Contents of Journal of Photopolymer Science and Technology
Volume 15, Number 1-5 (2002) 775
Instructions to Authors and Manual for Manuscript Writing 787