Volumes 2, Number 1, 1989
Recent Advances in the Design of Chemical Amplification Resists. 1-10
Hiroshi Ito and Mitsuru Ueda
16M Bit Technology. 11-19
Yoshifumi Kawamoto, Shinichiro Kimura, Tohru Kaga, Nobuo Hasegawa, Tokuo Kure. Atsushi Hiraiwa
and Masakazu Aoki
Synthesis and Photochemical Reaction of Self-sensitized Photosensitive Polymer Containing Pendnt Propargyl Moiety. 21-23
Tadatomi Nishikubo, Katsumi Inomata and Tsutomu Shimokawa
Intra- amd Inter-molecular Photocrosslinking of Photopolymer with Chromophore in Its Main Chain. 25-32
Yoichi Shindo, Yoichi Tomizawa, Tokuko Sugimura, Kazuyuki Horie and Itaru Mita
Synthesis and Characterisitcs of Crosslinkable Thermoresistive Photoresists. 33-38
Yoichi Namariyama, Akihiro Kinoshita, Hidetoshi Takao, Kenichiro Nakamura, Taketeru Asano and
Hiroshi Umehara
Synthesis and Properties of New Fluorinated Polyimides. 39-40
Toshihiro Ichino and Shigekuni Sasaki
Photocrosslinking Reaction of Polyimide Containing Benzophenone Unit. 41-42
Toshi Yamashita, Hiroyuki Higuchi, Kazuyuki Horie and Itaru Mita
Preparation and Properties of Positive Photosensitive Polyimides Containing o-Naphthoquinonediazide in the Polymer Side Chains. 43-44
Hideaki Mochizuki, Toshihiko Omote, Kenichi Koseki and Tsuguo Yamaoka
Synthesis and Charctarization of Positive Photosensitive Polyimides. 45-50
Shigeo Kubota, Youko Tanaka, Toshimoto Moriwaki and Shohei Eto
Tung Oil-pyrogallic Acid Resin(TPA) and Its Application to a Positive Photoresist. 51-56
Yu Shungxian, Gu Jiangnan, Wang Fang and Fu Xiaoyuan
Synthesis of New Alternating Copolymers of N-Vinylcarbazole and Their Application as Resist Materials. 57-58
Weiping Zeng, Yasuhiro Yoneda, Yasuhiko Shirota, Masataka Endo and Yoshiyuki Tani
Synthesis of New Metal-free Diazonium Salts and Their Application to Microlighography. 59-65
Shou-ichi Uchino, Michiaki Hashimoto and Takao Iwayanagi
Contrast Enhancement Materials Using Metal-free Diazonium Salts. 67-73
Hirokazu Niki, Akitoshi Kumagae and Masataka Miyamura
A New Resist Profile Simulation on the Basis of Analysis on Dissolution Properties of Resist Components. 75-82
Toru Ushirogouchi, Yasunobu Onishi and Akitoshi Kumagae
Image Reversal of Silicone-based Positive Photoresist(SPP): Application to Sub-halfmicron Lithography and Its Radiation Chemistry. 83-88
Hiroshi Ban, Akinobu Tanaka abnd Kimiyoshi Deguchi
Study on a Positive Photoresist with High Eching Resistance. 89-93
Wang Zheng-fang, Du Yu-Gian and Xu Jun
The Positive Pattern Fabrication by Silylation Process. 95-101
Norio Ishikawa, Masao Miyazaki, Hayato Katsuragi, Kiyoto Mori, Hitomi Yamada, Shinzo Morita and
Shuzo Hattori
Polyladder Organo Siloxane Bi-level Resist. 103-108
Keiji Watanabe and Shoji Shiba
Photopolymerization of Poly(silsesquinoxane) Resist for Excimer Laser Lithography. 109-114
Miwa Sakata, Toshio Ito and Yoshio Yamashita
Negative Electron Beam Resist Utilizing Silanol-condensation Reaction Chemical Amplification System (2). 115-122
Emiko Aoki, Hiroshi Shiraishi, Nobuaki Hayashi and Takumi Ueno
KrF Excimer Laser Resist Using 2-Diazo-1,3-Di-carbonyl Compounds. 123-131
Yoshiyuki Tani, Masaru Sasago and Harry Fujimoto
Morphological Modification Ablated on Poly(ethylene 2,6-naphthalate) by Excimer Lasers. 133-137
Hiroyuki Niino, Masashi Nakano, Shozaburo Nagano, Akira Yabe, Hisao Moriya and Tetsuro Miki
Application of Vinyl Imidazole Copolymer to Deep UV Resist. 139-141
Yasuhiro Yoshida, Hirofumi Fujioka
and Hiroyuki Nakajima
Volumes 2, Number 2, 1989
Phoochromic Properties of Water-soluble Spiropyrans in Reversed Micelles. 143-146
Hideo Tomioka, Shigeru Murata and Fumihiro Inagaki
Photochromism of Spiropyrans in Bilayers Intercalated betweeen a Smectic Clay. 147-152
Takahiro Seki and Kunihiro Ichimura
Photo-imaging System Containing Leuco Dyes and Halogenated Polymers. 153-162
Yoshiaki Inaki, Nobuo Aoki, Kumihide Honda, Takehiro Minami and Kiichi Takemoto
A New Method for Film Permeation by the Combination of Chemiluminescence and Photonic Detectors. 163-168
Mitsuo Hiramatsu, Hiroji Muraki and Toshiaki Ito
Study of Excimer Emission from Ultra Fine Pigment of Perylene Dispersed in Polymer Binder. 169-175
Youichi Higuchi, Kazumasa Kurokawa, Toshibumi Sakata and Kenichiro Nakamura
Polymerization of Diacetylene LB Film by X-ray Irradiation and Third-order Harmonic Generation on the Films. 177-184
Hideharu Tamura, Norihisa Mino and Kazufumi Ogawa
Spectroscopic Evaluation of PDA L and LB Films. 185-192
Hideji Tamura, Norio Mino and Kazufumi Ogawa
Sensitized Photolysis and Triplet Energy Transfer to Azidomethylated Polystyrene in Solid Film. 193-198
Hiroshi Morita and Junichiro Shimizu
Photoinitiation Systems Containing Bromo Compounds. 199-204
Masahiko Harada, Masami Kawabata and Yasuyuki Takimoto
The Stability of Acrylated Coatings
with Fast Curing. 205-210
Ikuo Nakaya and Hidenobu Ishikawa
Studies on Resin of UV Curable Lithographic Inks. 211-216
Michio Takayama, Hiroyuki Ishii, Yoshiyuki Yamashita and Shinichi Hatta
Image Formation by UV Ink Film and Its Application to Color Proofing System. 217-223
Isamu Hosoi, M. Ohta, Susumu Tsuchiko and Tatefumi Kayano and Masujiro Sumita
Photopolymerization of UV Curable Coatings. 225-230
Hiroshi Yamashita, Daisuke Ito, Kazuo Murakami and Hiroyuki Ito
UV Curing of Acylate Monomers Activated with Resol Resin. 231-236
Naoki Yoshioka, D. W. Nurhajati, Hiroyuki Nishide, Eishun Tsuchida and Masanori Kasai
Pigment Dispersed Photosensitive Materials. 237-241
Toshio Komatsu and Kunihiro Ichimura
Color Filters from Pigment-dispersed Photopolymers. 243-248
Tokiko Shimizu, Takashi Inami, Hirozo Takegawa, Ryutaro Akutagawa, Kayoko Kodama ,Shin-ichi Aso, Kesanao Kobayashi and Nobuaki Matsuda
Changes of Chemical Structures in the Photodegradation of Polymer Films and Accelerated Photodegradation Behavior. 249-252
Masahiro Tsunooka, Kyoung-Hun Song, Masaru Nagato and Makoto Tanaka
Evaluation of Nonlinear Optical Susceptibility of Polydiacetylenes by Third Harmonic Generation. 253-259
Hiroo Matsuda, Shunji Okada, Hachiro Nakanishi and Masao Kato
Low-temperature Excess Loss of UV-curable Acrylate Coated Optical Fibers. 261-268
Takao Kimura
Photocrosslinking of LDPE and Its Application for Wires and Cables. 269-276
Qu Baojun, Shi Wengfang and Bent Raenby,
Progress of Photopolymers in 1988. 277-318
Akira Umehara
Volumes 2, Number 3, 1989
Introduction: Symposium on the Reaction Mechanism and Recent Development of the ortho- Diazonaphthoquinone Photoresist. 324-324
Minoru Tsuda
Elementary Reactions in Photochemistry of 2-Diazoquinones and 2-Diazoketones. 325-339
Minoru Tsuda and Setsuko Oikawa
Reaction of Six-membered Ring α-Diazoketones. 341-350
Katsumi Tanigaki, Toshiyuki Honda and T. W. Ebbesen
Nanosecond Time-resolved Spectroscopic Study on the Photochemical Conversion of 1,2-Naphthoquinonediazides. 351-354
Tsuyoshi Shibata and Tsuguo Yamaoka
Image Hardening by UV-, Pulsed Electron Beams and Crosslinking Agents. 355-363
Hiroyuki Hiraoka
A Chemical Reaction and Influence of Flood-exposure Light Wavelength on REL (Resolution Enhanced Lithography). 365-374
Hirobumi Fukumoto, Y. Okuda, Y. Takashima, S. Ueda and M. Inoue
LENOS: Latitude Enhacement Novel Single Layer Lithography. 375-382
Sachiko Ogawa, Shigeo Uoya, Hiroshi Kimura and Hitoshi Nagata
Novolak Structres Suitable for High Resolution Photoresist and Applications. 383-390
Akihiro Furuta and M. Hanabata
Aliphatic Diazoketones for KrF Excimer Laser Lithography. 391-400
Hisashi Sugiyama, K. Ebata, A. Mizushima and K. Nate
Key Factors to Improve the Resolution of Positive Working Photoresist. 401-407
Tameichi Ochiai, Hideo Makishima and Yasuhiro Kameyama
Mechanism of Insolubilization of LMR and LMR-UV Resists. 409-415
Yoshio Yamashita and Taketeru Asano
Image Reversable Resist for G-line Exposure: Chemistry and Lithographic Evaluation. 417-428
Gerhard Buhr, Helmut Lenz and Siegfried Scheler
Evaluation of Deep UV ANR Photoresist for 248.4 nm Excimer Laser Photolighography. 429-443
James W. Thackeray, George W. Orsula, Dianne Canistro and Amanda K. Berry
Evaluation of the DESIRE Process. 445-451
Kazunori Katoh, Yuji Furuta, Keiichi Yamada, Mitsunobu Koshiba, Shinichi Kawamura and Yoshiyuki
Harita